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High purity 4N5 titanium Rotatable target
Product Description
High purity Ti Rotatable target
Size od64*ID36*L1688mm
Purity:99.99%-99,999%
Target type:Planar sputtering target,Rotary sputtering target;Circle target;
The element composition will be under strict control:and the analytical methods will adopt:
1,Metallic elements will use ICP-OES to test.
2,Gas elements will use LECO to test
The titanium sputtering target application:
Size od64*ID36*L1688mm
Purity:99.99%-99,999%
Target type:Planar sputtering target,Rotary sputtering target;Circle target;
The element composition will be under strict control:and the analytical methods will adopt:
1,Metallic elements will use ICP-OES to test.
2,Gas elements will use LECO to test
The titanium sputtering target application:
- Decorative coatign
- Hardware tool coating
- Semiconductor
- Flat panel displays