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High purity 4N5 titanium Rotatable target

 

Product Description


  High purity Ti Rotatable target
Size od64*ID36*L1688mm
Purity:99.99%-99,999%
Target type:Planar sputtering target,Rotary sputtering target;Circle target;
The element composition will be under strict control:and the analytical methods will adopt:
1,Metallic elements will use ICP-OES to test.
2,Gas elements will use LECO to test


The titanium sputtering  target application:
  1. Decorative coatign
  2. Hardware tool coating
  3. Semiconductor
  4. Flat panel displays