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High purity 4N5 titanium Rotatable target
Product Description
High purity Ti Rotatable target
Size od64*ID36*L1688mm
Purity：99.99%-99,999%
Target type：Planar sputtering target，Rotary sputtering target；Circle target；
The element composition will be under strict control：and the analytical methods will adopt：
1，Metallic elements will use ICP-OES to test.
2,Gas elements will use LECO to test
The titanium sputtering target application：
Size od64*ID36*L1688mm
Purity：99.99%-99,999%
Target type：Planar sputtering target，Rotary sputtering target；Circle target；
The element composition will be under strict control：and the analytical methods will adopt：
1，Metallic elements will use ICP-OES to test.
2,Gas elements will use LECO to test
The titanium sputtering target application：
- Decorative coatign
- Hardware tool coating
- Semiconductor
- Flat panel displays
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